STUPIDSID
1(a)
Give few examples of MEMS device which are characterized by sensors and actuators.
5 M
1(b)
Explain the sacrificial layer and its role in fabrication of MEMS devices.
5 M
1(c)
What are the characteristics of Micro-heater?
5 M
1(d)
In case of photolithography, Compare the two types of photo-resist used
5 M
2(a)
Discuss the process of photolithography. Mention the types of photolithography suitable for at least two MEMS devices with justification.
10 M
2(b)
Discuss selection of material based on applications. Support your answer by considering suitable example.
10 M
3(a)
A 30 &mu
10 M
3(b)
Explain Dry etching & Wet etching in fabrication process of MEMS devices.
10 M
4(a)
Describe the representative process flow for fabricating the ink jet printer head by Hewlett-packard. Also explain the operating principle of this MEMS device in detail.
10 M
4(b)
Differentiate between bulk and surface micromachining for fabrication of MEMS devices with suitable example.
10 M
5(a)
State various Chemical Vapor Deposition techniques. Explain in brief the techniques of Chemical Vapor Deposition for MEMS device fabrication.
10 M
5(b)
Explain transduction pertaining to microfilm strain gauge. State the factors that lead to thin film stress.
10 M
Write a short note on (any three)
6(a)
Photolithography (Compare major types of exposure system)
7 M
6(b)
Anodic bonding
7 M
6(c)
Reliability of MEMs devices.
7 M
6(d)
Applications of MEMS in Biomedical Instrumentation.
7 M
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